Hitachi

サイト名称 日立ハイテク

Title Low Damage TEM sample Preparation of Silicon Semiconductor “FinFET” Using NX200…
Details HTD-FIB-E019
Overview Low Damage TEM sample Preparation of Silicon Semiconductor “FinFET” Using NX2000.
Product type ・Focused Ion Beam Systems (FIB)
・Electron Microscopes (SEM/TEM/STEM)
Field 1 Materials science
Field 2 Semiconductors (incl. materials) / Devices / Components / Displays & Lighting
Information type Technical Note
Issue date 2017/01/22
Inquiry Inquiry
No. HTD-FIB-E019