Title | Damage layer thickness of the low voltage FIB vs that of the Xe ion beam |
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Details | HTD-FIB-E058 |
Overview | “Damage layer thickness of the low voltage FIB vs that of the Xe ion beam“ Further details can be found on our membership website. We would appreciate your joining. About our membership site, see https://www.hitachi-hightech.com/global/science/guide/ |
Related links (products) | |
Product type | ・Focused Ion Beam Systems (FIB) ・Transmission Electron Microscopes (TEM) |
Field 1 | Materials science |
Field 2 | Semiconductors (incl. materials) / Devices / Components / Displays & Lighting |
Information type | Technical Data / Data Sheet |
Issue date | 2019/03/12 |
Inquiry | Inquiry |
No. | HTD-FIB-E058 |