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Applications：Comparison of sputtering yield on Si single crystal by Ar and Xe ion milling

Title Comparison of sputtering yield on Si single crystal by Ar and Xe ion milling
Details HTD-FIB-E072
Overview Comparison of sputtering yield on Si single crystal by Ar and Xe ion milling
Related links (products)
Product type Focused Ion Beam Systems (FIB)
Field 1 Materials science
Field 2 Semiconductors (incl. materials) / Devices / Components / Displays & Lighting
Information type Technical Data / Data Sheet
Issue date 2019/11/11
Inquiry Inquiry
No. HTD-FIB-E072