General Description
General Description - Vortex®-EM
Vortex®-EM silicon drift X-ray detectors feature active areas between 30 mm2 and 80 mm2.
Vortex®-EM detectors are produced from high purity silicon using state-of-the-art CMOS production technology. They feature excellent energy resolution (<130 eV FWHM at Mn Kα is typical) and a high count rate capability. At 0.1 µs PT with an output count rate of 900 kcps is achieved. A unique feature of these detectors is their ability to process high count rates with very small loss in energy resolution and minimal peak shift with count rate.
Typical Applications
- X-ray fluorescence (XRF) spectroscopy both bulk and micro-fluorescence
- Micro-analysis for SEM and TEM
- Synchrotron radiation applications
- Partical Induced X-ray Emission (PIXE)
- Process control
- Fast X-ray mapping
The Vortex®-EM is operated at near room temperature and cooled by a thermoelectric cooler (TEC) and can be cycled as frequently as needed without any degradation in detector performance. Cool down times are typically less than 2 minutes.
The Vortex®-EM X-ray spectroscopy system include a detector unit and control box which includes power supplies for the detector, TEC and an optional digital pulse processor with PI-SPEC Software.
The complete detector also contains a charge-sensitive preamplifier and temperature stabilization system, which eliminates concerns of varying ambient temperature.
Features
- Extended probe (300 mm)
- Available in 30, 40, 50, 65, 70, 80 mm2
- Available in thickness of 0.5 and 1 mm
- Superb energy resolution
- Detector temperature stabilization
- Additional sizes are available under special contracts
- Small and compact package for minimum vibration
- Digital pulse processor (DPP) with PI-SPEC Software